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Subband Optical Transitions in a-Si:H Quantum Well Structures

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摘要 The hydrogenated amorphous silicon(a-Si:H)/silicon carbide(a-SiCx:H)quantum well(QW)and superlattice structures were fabricated by glow discharge deposition.Wavelength differential absorption spectroscopy has been applied to study the subband transition in a-Si:H/a-SiC_(x):H Q W,and derivative spectra change clearly from a linear to a step-like form when a-Si:H well-layer thickness has decreased below 40Å.These results indicate that three-dimensional parabolic band transition is turned into subband transition in the a-Si:H QW.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 1991年第8期432-435,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China.
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