公转结构电子束蒸发成膜的膜厚误差研究

Film Thickness Error in Electron Beam Evaporation with Revolving Structure

对公转结构电子束蒸发镀膜机的膜厚误差进行研究。提出一种基于非余弦膜厚分布理论的膜厚误差分析方法,并用数学方法对膜厚误差的分布进行表征。膜厚误差是基板表面位置的函数,不仅与镀膜工艺参数有关,还与蒸发源和基板之间的空间结构配置有关。理论分析表明,电子束蒸发源偏离工件盘公转轴,是引起膜厚误差的根本原因。在直径为2700 mm的镀膜机上镀制了三层介质膜,利用光谱反演膜厚误差,其结果与膜厚误差分布理论分析结果一致。

In this work,we studied film thickness error in an electron beam evaporator with revolving structure.Using the noncosine film-thickness distribution theory,we propose a method for analyzing the film thickness error,in which the film is formed on the dome structure,and characterize the thickness error distribution using a mathematical method. Analysis shows that the film thickness error is the function of the location of film deposition,which is related not only to the mechanical configuration between evaporation source and substrate but also to the thin-film manufacturing parameters. Results reveal that the film thickness error comes from the deviation of the electron beam evaporation source from the axis of the revolving dome. We prepared a three-layer thin film on a2700-mm-diameter coating machine. The film thickness error was retrieved using the spectral method. The results are consistent with the theoretical results of thickness error distribution.