摘要
Various helium-containing titanium films were deposited on Si substrates by magnetron sputtering under different helium/argon (He/Ar) ambiances.Helium concentrations and corresponding depth profiles in the Ti films are obtained by elastic recoil detection analysis (ERDA).X-ray diffraction (XRD) measurements are carried out to evaluate the crystallization of the titanium films.Vacancy-type defects and their depth profiles were revealed by slow positron beam analysis (SPBA).It is found that the defect-characteristic parameter S rises with the increment of the He/Ar flow ratios.The variation of S indicates the formation and evolution of various Herelated defects,with uniform distribution into the depth around 400nm.
作者
LI Yue
DENG Ai-Hong
ZHOU Yu-Lu
ZHOU Bing
WANG Kang
HOU Qing
SHI Li-Qun
QIN Xiu-Bo
WANG Bao-Yi
李悦;邓爱红;周宇璐;周冰;王康;侯氢;施立群;秦秀波;王宝义(Department of Physics,Sichuan University,Chengdu 610064;Key Laboratory of Radiation Physics and Technology of Ministry of Education,Institute of Nuclear Science and Technology,Sichuan University,Chengdu 610064;Institute of Modern Physics,Fudan University,Shanghai 200433;Laboratory of Nuclear Analysis Technique,Institute of High Energy Physics,Chinese Academy of Sciences,Beijing 100049)
基金
Supported by the National Natural Science Foundation of China under Grant Nos 10775102 and 10775101.
