Harnessing Light and Single Masks to Create Multiple Patterns in a Ternary Blend with Photoinduced Reaction

Using cell dynamics system simulation,we provide a simple way to form differently ordered patterns in a photosensitive,immiscible ABC ternary blend.The first pattern is established by irradiating the sample through a mask,which serves to pin the non-photoactivity C regions and thereby promotes the self-assembly of A and B into ordered domains.When the mask is removed,the photoactivity of the AB blend leads to different periodic patterns.Thus,the use of one mask permits the creation of multiple ordered morphologies,which can be stable for a long time by quenching the system at the appropriate time or choosing a suitable composition ratio and mask shape.Furthermore,the influence on the morphology of the composition ratio,the shape of the mask,and the illumination intensity are studied systematically.