摘要
Reversed field pinch(RFP)and ultralow safety factor plasma experimental performances with pulsed discharge cleaning and siliconization on SWIP-RFP device are presented.The xvall siliconization ivas performed by using the device discharges.The experimental results with siliconization in RFP devices showed that the impurity concentrations were decreased in the plasma and better plasma parameters were obtained in the device.
基金
Supported by the National Natural Science Foundation of China
the Nuclear Science Foundation of China。