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Experimental Results with Siliconization in Reversed Field Pinch Device

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摘要 Reversed field pinch(RFP)and ultralow safety factor plasma experimental performances with pulsed discharge cleaning and siliconization on SWIP-RFP device are presented.The xvall siliconization ivas performed by using the device discharges.The experimental results with siliconization in RFP devices showed that the impurity concentrations were decreased in the plasma and better plasma parameters were obtained in the device.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 1996年第5期378-381,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China the Nuclear Science Foundation of China。
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