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Influence of Boron Dopant on Switching Behaviour of Polycrystalline Diamond Thin Films

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摘要 Switching behaviour of polycrystalline diamond thin films is reported.Boron-doped diamond thin films were deposited by microwave plasma-assisted chemical vapor deposition on silicon substrate.Dependence of switching behaviour on boron impurity has been investigated.The threshold voltage obviously decreases with increasing content of boron dopant.
作者 WANG Xiao-ping WANG Li-jun XU Yue-e SHEN Shu-po 王小平;王丽军;许月娥;沈书泊(Department of Applied Science,Zhengzhou Institute of Aeronautical Industrial Management,Zhengzhou 450052;Institute of Physics Engineering,Zhengzhou University,Zhengzhou 450052)
出处 《Chinese Physics Letters》 SCIE CAS CSCD 1997年第10期772-774,共3页 中国物理快报(英文版)
关键词 BORON BEHAVIOUR DIAMOND
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