The Theoretical Investigation and Analysis of High-Performance ZnO Double-Gate Double-Layer Insulator Thin-Film Transistors

A novel structure of a ZnO thin-film transistor with a double-gate and double-layer insulator is proposed to improve device performance.Compared with the conventional ZnO thin-film transistor structure,the novel thinfilm transistor has a higher on-state current,steeper sub-threshold characteristics and a lower threshold voltage,owing to the double-gate and high-k dielectric.Based on two-dimensional simulation,the potential channel distribution and the reasons for the improvement in performance are investigated.