摘要
A method of synthesizing cubic boron nitride(c-BN)films by the magnetron arc-discharge plasma ion plating was investigated.A nearly pure c-BN film was obtained by reacting boron vapor with high-density nitrogen ions,and using hot cathode arc-discharge plasma in a parallel magnetic field around the substrate.The structure of the films obtained was characterized by using infrared absorption spectroscopy and x-ray diffraction analysis.After numerous experiments,the phase pattern of the bias vs the current in synthesizing c-BN was found.
