Optical and Electric and Structural Properties of Ti_(1-x)Al_(x)N Thin Films

A sequence of Ti_(1-x)Al_(x)N films has been prepared by rf reactive magnetron sputtering.The optical and electric properties versus aluminum content x have been studied.Values suitable for magneto-optic protective layers have been achieved in Ti_(1-x)Al_(x) N thin films with aluminum content x>0.75.X-ray diffraction results show that Ti_(1-x)Al_(x) N thin films in this study are a bcc structure up to x=0.75,further increase in the aluminum content gives a wurtzite structure.All of the results show that the optical and electric properties of Ti_(1-x)Al_(x) N films might be related to the crystal structure.