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Annealing effects on the optical and electrochemical properties of tantalum pentoxide films 被引量:2

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摘要 Tantalum pentoxide(Ta_(2)O_(5)) has attracted intensive attention due to their excellent physicochemical properties.Ta_(2)O_(5) films were synthesized via electron beam evaporation(EBE)and subsequently annealed at different temperatures ranging from 300 to 900℃.X-ray diffraction(XRD)results show that amorphous Ta_(2)O_(5) thin films form from 300 to 700℃ and then a phase transition to polycrystalline β-Ta_(2)O_(5) films occurs since 900℃.The surface morphology of the Ta_(2)O_(5) films is uniform and smooth.The resulted Ta_(2)O_(5)films exhibit excellent transmittance properties for wavelengths ranging from 300 to 1100 nm.The bandgap of the Ta_(2)O_(5) films is broadened from 4.32 to 4.46 eV by annealing.The 900℃ polycrystalline film electrode has improved electrochemical stability,compared to the other amorphous counterparts.
出处 《Journal of Advanced Ceramics》 SCIE CAS CSCD 2021年第4期704-713,共10页 先进陶瓷(英文)
基金 supported by the Joint Research Funds of Department of Science&Technology of Shaanxi Province and Northwestern Polytechnical University(Grant No.2020GXLH-Z-029).
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  • 1Hossin A A and Dowdye E 2005 SPIE 5897 589705-1.
  • 2Allenspacher P, Riede W and Wernham D 2005 SPIE 5991 599128-1.
  • 3Riede W and Allenspacher P 2004 Fifth International Conference on Space Optics (ICSO, Toulouse, France, 30 March-2 April 2004) p 839.
  • 4Scurlock C 2005 SPIE 5647 82.
  • 5International Standard ISO 11254-1 2000 (Printed in Switzerland, ISO Copyright Office).
  • 6NASA Reference Publication 1395 1997 (Virginia 23681- 2199, NASA Center).
  • 7Leplan H, Geenen B and Robic J Y 1994 SPIE 2253 1263.
  • 8Leplan H, Geenen B and Robic J Y 1995 J. Appl. Phys. 78.
  • 9IL Kim,Jong-Seok Kim,Oh-Seung Kwon,Sung-Tae Ahn,John S. Chun,Won-Jong Lee.Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition[J].Journal of Electronic Materials.1995(10)
  • 10G.N.Strauss,W.Lechner,and H.K.Pulker. Thin Solid films . 1999

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