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二氧化碳点阵激光治疗痤疮瘢痕的护理干预研究 被引量:3

Study on nursing intervention for acne scars treated by carbon dioxide lattice laser
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摘要 目的探讨二氧化碳点阵激光治疗痤疮瘢痕的护理干预效果。方法选取2018年12月—2019年12月于江门市皮肤医院接受治疗的面部痤疮瘢痕患者94例,所有患者均接受二氧化碳点阵激光治疗,治疗期间对所有患者实施针对性护理干预。比较分析护理前与护理后患者焦虑评分、抑郁评分以及护理总满意率情况。结果护理前患者焦虑评分为(59.54±3.48)分,高于护理后的(43.22±1.19)分,差异有统计学意义(P<0.05);护理前患者抑郁评分为(57.78±3.24)分,高于护理后的(42.15±1.31)分,差异有统计学意义(P<0.05);患者护理后总满意率为97.87%。结论痤疮瘢痕患者在实施二氧化碳点阵激光治疗的基础上采取针对性护理干预,可缓解患者存在的焦虑、抑郁等负面情绪,总满意率较高,值得临床推广及应用。 Objective To explore the nursing intervention effect of acne scar treated by carbon dioxide lattice laser.Methods From December 2018 to December 2019,94 patients with facial acne scar were selected in Jiangmen Dermatology Hospital.All patients received carbon dioxide lattice laser treatment.During the treatment,targeted nursing intervention was implemented for all patients.The anxiety score,depression score before and after nursing and total satisfaction rate of patients were compared and analyzed.Results The anxiety score of all patients before nursing was(59.54±3.48)score,higher than(43.22±1.19)score after nursing,and the difference was statistically significant(P <0.05).The depression score of all patients before nursing was(57.78 ±3.24)score,higher than(42.15 ±1.31)score after nursing,and the difference was statistically significant(P <0.05).The total satisfaction rate after nursing was 97.87%.Conclusion On the basis of carbon dioxide lattice laser treatment,targeted nursing intervention could relieve the anxiety,depression and other negative emotions of patients with acne scar,the total satisfaction rate was high,which was worthy of clinical promotion and application.
作者 陈洁珊 冯志芳 黄艳 吴绿叶 祝新 莫丽萍 CHEN Jie-shan;FENG Zhi-fang;HUANG Yan;WU Lv-ye;ZHU Xin;MO Li-ping(Medical Beauty Center,Jiangmen Dermatology Hospital,Jiangmen Guangdong Province 519000,China)
出处 《中国城乡企业卫生》 2021年第7期8-10,共3页 Chinese Journal of Urban and Rural Enterprise Hygiene
关键词 痤疮瘢痕 点阵激光 针对性护理 焦虑 抑郁 总满意率 Acne scars Lattice laser Targeted nursing Anxiety Depression Total satisfaction rate
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