微米-纳米分层阵列结构减反膜的制备

PREPARATION OF MICRO-NANO LAYERED ARRAY STRUCTURE ANTI-REFLECTION FILM

介绍一种基于聚二甲基硅氧烷(PDMS)材料的微米-纳米分层阵列结构双重减反膜。微米阵列结构模板图案由常规的激光直写光刻机光刻而成。微米阵列结构被复制到PDMS薄膜上,对PDMS薄膜进行等离子体表面修饰处理后在微米阵列结构上形成纳米褶皱结构,从而低成本制备出微米-纳米分层阵列结构双重减反膜。测试结果显示,所制备的微米-纳米分层阵列结构的PDMS减反膜可以将高效率多晶硅太阳电池的相对效率提高4.6%以上,相对反射率减小30%以上,并使减反膜表面的水接触角提高30°以上。

Polydimethylsiloxane(PDMS)film has attracted extensive attention in improving the performance of solar cells due to its low preparation cost,simple process and superhydrophobic properties. This paper introduces a micro-nano-layered array structure double anti-reflection film based on PDMS material. The microarray structure template pattern is photolithographically formed by a conventional laser direct writing machine. The microarray structure is replicated onto the PDMS film,and the PDMS film is subjected to plasma surface modification to form a nano-pleated structure on the micro-array structure. Thus,a micro-nano-layered array structure double anti-reflection film is prepared at low cost. The test results show that the prepared micro-nano layered array of PDMS anti-reflection film can increase the relative efficiency of high-efficiency polycrystalline silicon cells by more than 4.7%,decrease the relative reflectivity by 30.3%,and the water contact angle of the surface of the anti-reflection film is increased by more than 30°.