贵金属溅射靶材的研究进展

Research Progress on Precious Metal Sputtering Target

溅射靶材是磁控溅射制备薄膜的关键原材料,其质量决定着溅射薄膜的性能。贵金属溅射靶材因具有优异的物理和化学性能而广泛应用于高性能薄膜的制备。综述了贵金属溅射靶材制备方法、技术要求和应用情况的研究进展,指出高纯化、大尺寸、高利用率以及靶材生产与溅射镀膜一体化是贵金属靶材未来发展方向。

Sputtering targets are the key raw materials for the preparation of thin films by magnetron sputtering,and their quality determines the performance of the sputtered thin films.Precious metal sputtering targets are widely used in the preparation of high-performance thin films because of their excellent physical and chemical properties.The research progress on the preparation methods,technical requirements and application of precious metal sputtering targets is reviewed.The development direction of high purity,large size,high utilization rate,and integrated development of target production and sputtering film is put forward.