可低温激活的钛锆钒非蒸散型吸气剂薄膜的制备及其性能研究

Preparation and Properties of Low Temperature Activated TitaniumZirconium-Vanadium Non-Evaporable Getter Films

非蒸散型吸气剂材料是近年来广泛应用于真空领域的一种重要材料,但过高的活化温度限制了它的应用场景。本文使用比例均匀一致的钛锆钒合金作为靶材,经直流磁控溅射沉积了活化性能良好的非蒸散型吸气剂薄膜,使用X射线光电子能谱对薄膜的表面化学状态进行了分析。结果表明随着加热温度的升高薄膜表面成分呈现高氧化态-低氧化态-金属态的变化规律,该薄膜在150℃下加热后开始发生明显活化,并且在温度升高后活化程度进一步增高。薄膜在激活后具有良好的吸气性能,且薄膜的长时间使用具有可靠的稳定性。

Non-evaporable getter film is an important material widely used in the vacuum field in recent years.However,the excessively high activation temperature required by the getter film limits its application scenarios.In this paper,a constant ratio titanium-zirconium-vanadium alloy was used as the target material to deposit the non-evaporable getter film with good activation performance by DC magnetron sputtering.The surface chemical state of the film was analyzed by X-ray photoelectron spectroscopy.The results showed that the surface composition of thin films changed from high oxidation state to low oxidation state and then to metal state with the increase of heating temperature.Significant activation of this getter film began at as low as 150℃,and the degree of activation further increased after the temperature increased.The getter film had a good gettering performance after activation,and the film had reliable stability after long-term use.