群集式磁控溅射设备及工艺研究

Research of Cluster Magnetron Sputtering Equipment and Production Technology

本文介绍了一种专用于红外器件ZnS/CdTe双层钝化膜工艺的群集式磁控溅射设备。通过正交实验探索不同靶基距、靶偏心距对薄膜均匀性的影响,结果表明在靶基距为100 mm~160 mm、偏心距为160 mm~190 mm时,所沉积的ZnS薄膜均匀性优于5%,满足红外器件钝化膜层制备工艺需求。

This paper introduced a kind of cluster magnetron sputtering equipment for ZnS/CdTe bilayer passivation film with dual cavity that could produce continuously.The effects of different target distances and eccentric distances on the uniformity of the film were explored by orthogonal experiment.The results show that when the target distance is 100mm~160mm and the target eccentricity is 160 mm~190 mm,the uniformity of ZnS film deposited is better than 5%,which can meet the requirements of the passivation film preparation process for infrared devices.