柔性透明ITO导电聚酰亚胺薄膜的制备及光电性能

Preparation of Flexible Transparent ITO Conductive Polyimide Films and Their Optical and Electrical Properties

采用透明聚酰亚胺薄膜作为柔性衬底材料,通过射频磁控溅射法制备了不同氧化铟锡(ITO)厚度的柔性透明导电聚酰亚胺薄膜。对导电聚酰亚胺薄膜的透光率、方块电阻、禁带宽度、结晶结构及表面形貌等进行表征分析,系统研究了ITO厚度的影响规律。结果表明,柔性透明导电聚酰亚胺薄膜具有优异的表面平整性和柔韧性;ITO沉积厚度和生长机制会对导电薄膜的光电性能和结构形貌产生重要影响,且透光和导电性与结晶、表面形貌的变化密切相关。当ITO厚度为180 nm时,导电聚酰亚胺薄膜在550 nm的透过率为87.4%,方块电阻低至14.3 kΩ/□。研究结果对制备光电性能优良的柔性电极材料具有重要意义。

Based on the preferred polyimide film as substrate material,flexible transparent conductive polyimide films with different indium tin oxide(ITO)thicknesses were prepared using radio frequency magnetron sputtering method.Their optical transmittance in the UV-visible region,sheet resistance,energy gap,crystal structure as well as surface morphology of the series of conductive polyimide films were characterized and analyzed.The influence of ITO thickness on the photoelectric performance and structure morphology was systematically studied.The results show that these transparent conductive polyimide films prepared based on flexible substrates have excellent surface flatness and flexibility.It is proved that the deposition thickness and growth mechanism of ITO have an important impact on the transparency,electrical properties and structural morphology of conductive film.The light transmittance and conductivity changes are closely related with both their crystallinity and surface morphology.When the thickness of ITO is 180 nm,the transmittance of conductive polyimide film at 550 nm is up to 87.4%,and its sheet resistance is as low as 14.3 kΩ/□.The study results have great significance for preparing flexible electrode materials with excellent photoelectric properties.