关键尺寸扫描电镜校准及符合性评价技术研究

Research on CD⁃SEM Calibration and Conformance Evaluation

针对关键尺寸扫描电子显微镜(CD⁃SEM,Critical Dimension Scan Electron Microscope)的校准需求,在CD⁃SEM校准原理和方法研究的基础上提出了降低CD⁃SEM和标准样板质量属性对测量结果影响的方法,同时分析得到了标准样板同一位置可用于校准的最大次数,并通过100nm晶圆级一维栅格标准样板对Hitachi S9830 CD⁃SEM进行了校准和测量结果的不确定度评定;基于校准结果对Hitachi S9830 CD⁃SEM是否满足预期使用要求进行了符合性评价。结果表明,使用S9830 CD⁃SEM进行关键尺寸测量时,其示值误差满足预期使用要求,故无需调整。

In terms of satisfying the calibration requirement of CD⁃SEM,several ways are presented to reduce the effect of the CD⁃SEM and standard quality attribute on the measurement based on the research of calibration principle and method.The maximum times of standard that can be used for calibration at the same location is analyzed simultaneously,and then a calibrating process and uncertainty evaluation of Hitachi S9830 CD⁃SEM has been made by using the 100nm nanolattice wafer standard,and a conformance evaluation whether the CD⁃SEM satisfy the expected requirement has been made based on the calibration result.It shows that the indicating error of S9830 CD⁃SEM is less than the combined uncertainty when used for critical dimension measure,adjusting the CD⁃SEM is not need.