化学浴沉积硫化铅薄膜及其晶体结构

Chemical bath deposition of lead sulfide film and its crystal structure

采用化学浴沉积法(CBD)在玻璃衬底上制备了PbS薄膜,探究了沉积时间(20~100 min)对其厚度、微观形貌、晶体结构和禁带宽度的影响。结果表明,化学浴沉积所得的Pb S薄膜均匀、致密,呈镜面光亮的黑色。随着沉积时间的延长,Pb S薄膜厚度先快速后缓慢增大,微观形貌逐渐由片状结构转变为立方体结构,择优生长取向从(200)转变为(220),禁带宽度先减小后增大。沉积60 min所得PbS薄膜的厚度约为853 nm,以(220)晶面为生长取向,禁带宽度为0.205 eV,光学性能最佳。

PbS thin films were prepared on glass by chemical bath deposition(CBD). The effect of deposition time ranging from 20 min to 100 min on thickness, micromorphology, crystal structure, and band gap of PbS thin film was studied. The results showed that the PbS films prepared by chemical bath deposition were mirror-bright and black with a uniform and compact microstructure. With the extending of deposition time, the thickness of PbS thin film was increased quickly and then slowly, its micromorphology was transferred from laminated structure to cubic structure, its preferential orientation was changed from(200) plane to(220) plane, and its band gap was increased initially and then decreased. The PbS thin film obtained by chemical bath deposition for 60 min had a thickness of 853 nm or so, a(200) preferred orientation, and the optimal optical property with a band gap of 0.205 eV.