摘要
采用X-射线衍射法研究了在控制电位或电流沉积得到的锌镀层的织构.结果表明,锌镀层的晶面取向强烈地依赖于极化电位及沉积时间.根据几何选择理论和向外生长模式,以及结晶学、电化学因素讨论了所得的结果.金属电沉积层的机械物理性能决定于沉积层的微观结构,而后者又与镀液的组成和沉积条件密切相关.
The texture of zinc electrodeposils prepared under controlled polarized potential and current density was studied by means of X-ray diffraction. It was observed that the crystal orientation of zinc ekectrodeposits strongly depends upon the polarized potential and duration of electrodeposition. The obtained results were discussed on the basis of geometrical selection theory and outward mode of growth, and also with the crystallographic and electrochemical factors.
作者
许书楷
黄泰山
周绍民
Xu Shukai;Huang Taishan;Zhou Shaomin(Department of Chenistry,Xiamen University,Xiamen)
出处
《高等学校化学学报》
SCIE
EI
CAS
1985年第5期441-446,共6页
Chemical Journal of Chinese Universities
基金
中国科学院科学基金。