甲基异丙烯基酮在烷烴中的聚合反应及以其聚合物为基础的远紫外抗蚀剂

POLYMERIZATION OF METHYL ISOPROPENYL KETONE IN HYDROCARBONS AND DEEP UV RESIST MATERIAL ON THE BASIS OF ITS POLYMER

采用AIBN引发剂,在C_(6)-C_(12)烷烃中研究了甲基异丙烯基酮(MIPK)的聚合反应规律,结果表明MIPK的聚合反应速率,随着烷烃分子中碳原子数的增加而增加,但对聚合物的无显著影响。测定了PMIPK及增敏后聚合体的UV光谱、热稳定性以及光降解前和用氢灯辐照40、160分钟后的IR谱图。表明除了聚合物主链断裂之外,还有由于降解而产生的单体。用含有不同增敏剂的PMIPK制成了可以与不同波长光源的光谱主峰相匹配的远紫外抗蚀剂。以增敏的PMIPK涂在镀铬玻璃基片上,通过软接触分辨率板作远紫外曝光、显影、化学蚀刻,得到0.4μ的清晰线条。

The rules of the polymerization process of MIPK using AIBN as initiator in the C6-C12 hydrocarbons were studied.The results show that the rate of polymerization increases with the number of carbon atom in hydrocarbon,while Mηof the polymer is not significantly affected whatever hydrocarbon is used.The UV spectral sensitivity,thermal stability of the PMIPK and the sensitized PMIPK,as well as the IR spectra of PMIPK before photodegradation and after exposure to hydrogen lamp for 40 min and for 160 min,were closely observed.It has been shown that the monomer is produced during photodegradation in addition to the scission of main chain of the polymer.A series of the sensitized deep UV photoresists suitable for different wavelength were obtained.The sensitized PMIPK was coated on a Cr-coated glass plate,then exposed to deep UV through a soft contacting resolutional photomask.A lot of,very clean and fine lines of 0.4μwere obtained after developing and chemical etching,meeting requirements for microfabrication.