摘要
直线等离子体装置(Linear Plasma Device,LPD)是研究托卡马克上边界等离子体与材料相互作用的重要平台。本文针对新建LPD的真空系统设计研制开展了相关研究。该真空系统设计为两级隔断式结构,等离子体放电和材料预处理可以在各自真空腔室同步进行、互不干扰。通过真空测试实验,真空控制系统运行稳定,短时间烘烤后系统极限真空达1.4×10^(-5)Pa,满足LPD对洁净真空环境的要求。
Linear plasma device(LPD)is an important platform for studying plasma and wall material interaction.It was presented that the design and test of vacuum system for a new LPD device,called material sputtering experimental device(MSED).The vacuum vessel is divided into two parts of plasma discharge vessel and material pretreatment vessel.The related experiments could be carried out in their own vessel without affecting each other.The test experiment is carried out by the new vacuum control system.The results show that the limit vacuum is 1.4×10^(-5) Pa after a baking cycle,which meets the design requirements.The material samples could be transferred with the maximum distance of~1800 mm.The stable and reliable operation of the vacuum system is benefit to the achievement of ultra-clean vacuum.
作者
王俊儒
余耀伟
曹斌
庄会东
胡建生
WANG Jun-ru;YU Yao-wei;CAO Bin;ZHUANG Hui-dong;HU Jian-sheng(Institute of Plasma Physics,Hefei Institutes of Physical Science,Chinese Academy of Sciences,efei 230031,China;University of Science and Technology of China,Hefei 230026,China)
出处
《真空》
CAS
2021年第5期32-36,共5页
Vacuum
基金
中科院重大科技基础设施开放研究项目(长脉冲运行中实时抑制钨表面溅射的实验研究)
国家重点研发项目(2017YFE0301100)资助。
关键词
材料溅射实验装置
材料辐照
真空系统
抽速
material sputtering experimental device
material exposure
vacuum system
pumping speed
