摘要
近年来,集成电路、热交换器、半导体等行业的快速发展对碳化硅陶瓷的导热性能提出了更高的要求。碳化硅陶瓷内部存在的晶格氧、晶界、气孔等缺陷导致其室温热导率远低于碳化硅单晶理论室温热导率。综述了添加剂、烧结工艺等因素对碳化硅陶瓷室温热导率的影响,并对高导热碳化硅陶瓷的未来发展方向进行了展望。
In recent years,the rapid development of integrated circuit,heat exchanger,semiconductor industry has put forward higher requirements for the thermal conductivity of SiC ceramics.The thermal conductivity at room temperature of SiC ceramics is much lower than the theoretical value of single crystal SiC because of the defects such as lattice oxygen,grain boundary and porosity.The effects of additives and sintering process on the thermal conductivity at room temperature of SiC ceramics are reviewed.The future development direction of high thermal conductivity SiC ceramics is prospected.
作者
王晓波
王峰
贺智勇
张启富
WANG Xiaobo;WANG Feng;HE Zhiyong;ZHANG Qifu(Central Iron&Steel Research Institute,Beijing 100081,China;China Iron&Steel Research Institute Group,Beijing 100081,China)
出处
《机械工程材料》
CAS
CSCD
北大核心
2021年第9期8-12,共5页
Materials For Mechanical Engineering
基金
国家科技重大专项项目(2013ZX02104)。
关键词
碳化硅陶瓷
热导率
添加剂
烧结工艺
SiC ceramics
thermal conductivity
additive
sintering process