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Deep profile soil moisture distribution characteristics for different microtopographies on the semi-arid Loess Plateau, China

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摘要 Soil moisture is a limiting factor for vegetation restoration on the Loess Plateau, China. Micro-topography may cause heterogeneities in the distribution of soil moisture, but little is known about its effect on deep soil moisture. Our study aims to explore the distribution and impact of soil moisture within the upper 10 m of soil for different microtopographies. Taking undisturbed slope as the control, five micro-topographies were selected. Soil moisture over a depth of 0-10 m from 2017 to 2019 was investigated, and soil particle size and soil organic matter were measured. Variance analysis and multiple comparisons were used to analyze the difference in soil moisture for different microtopographies and multiple-linear regression was used to analyze the influence of micro-topography on soil moisture. There are significant differences in soil moisture within the different layers underlying the examined micro-topographies, while the inter-annual variation in soil water storage for the selected microtopographies increase with increased rainfall. The depth of influence of micro-topographic vegetation on soil moisture exceeded 1000 cm for a gully(GU), 740 cm for a sink hole(SH), 480 cm for a scarp(SC), 360 cm for an ephemeral gully(EG) and 220 cm for a platform(PL). Micro-topography will cause the heterogeneous distribution of soil moisture in the shallower layers, which changes the vegetation distribution differences between micro-topographies. This may be the survival strategy of herbaceous vegetation in response to climate change in the Loess Plateau. For future vegetation restoration efforts, we need to pay attention to the influence of microtopography on soil moisture.
出处 《Journal of Mountain Science》 SCIE CSCD 2021年第10期2688-2697,共10页 山地科学学报(英文)
基金 financially supported by the 13th Five-Year National Key Research and Development Project (No.2016YFC0501705) funded by the Ministry of Science and Technology (MOST),P.R.China。
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