正弦表面结构的薄膜失稳形貌有限元分析和实验验证

Finite element analysis and experimental verification of surface instability morphology of thin film with sinusoidal surface structures

利用ABAQUS有限元软件,对具有正弦表面结构的薄膜基底系统表面失稳过程进行了系统的有限元分析,讨论了正弦结构幅值/波长比、薄膜基底模量比、薄膜厚度以及预拉伸变形等因素对薄膜表面失稳形貌的影响。结果表明:薄膜基底模量比和薄膜厚度对薄膜的表面失稳波长造成较大影响;正弦结构幅值/波长比对正弦结构波峰与波谷处的失稳波长差值有显著影响。通过上述变量的相互组合,有望实现对膜基系统表面失稳形貌的调控。通过与实验结果的对比,定性地验证了数值模拟方法的可靠性。研究工作对于探究复杂表面结构的薄膜失稳形貌具有参考价值。

In this work, finite element analysis on the surface instability process of a film-substrate system with the sinusoidal surface structures is systematically carried out by using ABAQUS finite element software. The effects of the elements on surface instability morphology, including ratio of amplitude to wavelength of the sinusoidal structure, the modulus ratio of film to substrate, the film thickness and the pre-stretched deformation, are discussed. The results show that the modulus ratio and the film thickness have considerable influence on the wavelength of the film surface instability. The ratio of amplitude to wavelength of the sinusoidal structure plays a significant role in differentiating the instability wavelength at the peak and trough of the sinusoidal structure. Means to control the instability morphology of the film-substrate systems by various combinations of the above parameters are proposed. Compared with the experimental results, the reliability of the numerical simulation method is qualitatively verified. The research work is of reference value for exploring the instability of thin films with complex surface structures.