摘要
为了研制具有高效电磁屏蔽功能的反红外、透1064nm激光的滤光片,基于金属薄膜诱导理论和多层薄膜的干涉原理,设计了诱导滤光膜的膜系结构,并讨论了金属Ag薄膜厚度误差对滤光片光谱性能的影响。采用离子束辅助沉积的方式制备膜系中的介质薄膜,采用离子束溅射方式制备了金属Ag薄膜;利用放大膜厚控制误差的方法,精确地监控薄层金属Ag膜的沉积厚度,同时避免了Ag膜被氧化。通过工艺实验,制备的滤光片在1064nm激光波长的透射率达到88%以上、中长波红外波段反射率达90%以上,对18~36GHz电磁波屏蔽效能达到23dB以上,具有良好的中长波红外及电磁波屏蔽功能。
In order to develop an anti-infrared and 1064 nm laser filter wit efficient electromagnetic shielding function,based on the induction theory of metal film and the interference principle of multilayer,the influence of thickness error of Ag film on the spectral properties of filter is discussed.The dielectric films were deposited by ion beam assisted deposition,and the metal Ag film was deposited by ion beam sputtering.The thickness of Ag film can be precisely monitored by means of enlarging the film thickness control errors.And the oxidation of Ag film can be avoided.The transmittance of the filter at 1064 nm is over 88%,the reflectivity of mid-long wave infrared band is over 90%,and the shielding effectiveness of the filter at 18~36 GHz is over 23 dB.The filter has good shielding function of mid-long wave infrared and electromagnetic.
作者
张建付
王松林
杨崇民
李明伟
米高园
赵红军
ZHANG Jianfu;WANG Songlin;YANG Chongmin;LI Mingwei;MI Gaoyuan;ZHAO Hongjun(Xi’an Institute of Applied Optics,Xi'an 710065,China)
出处
《光学技术》
CAS
CSCD
北大核心
2021年第5期561-564,共4页
Optical Technique
关键词
电磁屏蔽
滤光片
Ag薄膜
离子束溅射
electromagnetic shielding
filter
Ag film
ion beam sputtering