反射镜基片无损伤清洗技术研究

Research on No-damage Cleaning Technology of Mirror Substrate

本文以抛光表面模型为理论,分析了基片表面损伤产生的机理,设计正交实验,得出了基片表面损伤产生的主要因素。通过改进清洗工艺,制备出了无损伤的超光滑表面。

In the field of optical processing, the focus of cleaning technology research was to improve surface cleanliness. Whether the cleaning process caused damage, due to the difficulty of damage detection, most of them were theoretical analysis and less experimental research. Based on the surface model of polishing, this paper analyzed the mechanism of substrate surface damage, designed the orthogonal experiment, and obtained the main factors of substrate surface damage.By improving the cleaning process, the super-smooth surface without damage was prepared.