B含量对(AlSiTiCrNbVB_(x))N薄膜微观结构与性能影响

Effect of B Content on the Microstructure and Properties of(AlSiTiCrNbVB_(x))N Films

为了研究B含量对(AlSiTiCrNbVB_(x))N薄膜微观结构和力学性能的影响,文中采用放电等离子烧结技术制备了B靶,并与AlSiTiCrNbV合金靶材进行镶嵌设计,向真空腔室通入N2进行反应磁控溅射,制备了(AlSiTiCrNbVB_(x))N薄膜,分析了薄膜物相结构、元素含量、形貌、成分以及硬度。试验结果表明:随着B元素含量的增加,薄膜由面心立方结构(FCC)转变为非晶结构;当原子数分数x(B)=18.20%时,硬度达62.32 GPa,其硬度接近人造金刚石。

The paper aims to study the effect of B content on the microstructure and mechanical properties of(AlSiTiCrNbVB_(x))N films.The B target was prepared by the spark plasma sintering technology,and the AlSiTiCrNbV alloy target was used for mosaic design.(AlSiTiCrNbVB_(x))N film was prepared by reactive magnetron sputtering with N2 introduced into the vacuum chamber.The phase structure,element content,morphology,composition and hardness of the film were analyzed.The experimental results show that the film changes from a face-centered cubic structure(FCC)to an amorphous structure with the increase in the content of B element.When atomic number fraction x(B)=18.20%,its hardness is as high as 62.32 GPa,close to that of synthetic diamond.