溅射电流对钛薄膜光电性能的影响

Effect of Sputtering Current on Photoelectric Properties of Titanium Thin Films

为了研究溅射电流对磁控溅射沉积钛薄膜光、电学性能的影响,在其它工艺参数相同的情况下改变溅射电流(0.3 A~0.8 A)制备了6组薄膜样品,采用四探针电阻测试仪测量样品的电阻率,用紫外可见分光光度计测量样品的透射率.同时,利用磁控溅射技术成功制取钛薄膜光栅,采用读数显微镜测量光栅常量.研究表明:钛薄膜电阻率随溅射电流的增大而减小,最小电阻率为3.0343Ω·cm;透射率随溅射电流的增大先减小后增大,最大透射率约为99%(对应溅射电流0.3 A),最小透射率约为0.03%(对应溅射电流0.7 A);测得钛薄膜光栅的光栅常量为(0.1701±0.0007)mm.

In order to study the influence of sputtering current on the electrical and optical properties of titanium thin films deposited by magnetron sputtering technology,six groups of thin film samples were prepared by changing sputtering current(0.3 A~0.8 A)under the same process parameters.The resistivity of the samples was measured by a four-probe resistance tester,and the transmission spectrum of the samples was measured by an ultraviolet-visible spectrophotometer.Titanium thin film grating was also fabricated by magnetron sputtering technology,and grating constant was measured by reading microscope.The results reveal that the resistivity of titanium thin films decreases with the increase of sputtering current,and the minimum resistivity is~3.0343Ω·cm;The transmittance firstly decreases and then increases with the increase of sputtering current,the maximum transmittance is about 99%(corresponding to sputtering current 0.3 A)and the minimum transmittance is about 0.03%(corresponding to sputtering current 0.7 A).The grating constants of titanium thin film grating is(0.1701±0.0007)mm.