光生阴极保护技术的研究进展及其存在的问题

Research progress and existing problems of photocathodic protection technology

本文综述了近年来光生阴极保护在拓宽光吸收范围、提升电子-空穴分离率与电子传导效率以及实现暗态保护等重要问题上的研究现状,重点归纳了六种改性方法,包括导电聚合物修饰、构建异质结、复合二维导电材料、调控形貌、掺杂金属或非金属元素以及耦合储能半导体,指出了当前暗态保护的持续时长较短、部分实验可重复率低等问题,分析并列举了目前尚未解决的技术难点,如克服自然光强度不足、电解质溶液条件苛刻和光生阴极系统设计的复杂性等;最后提出了开发自然光驱动半导体材料、制备胶状电解质与存储电解质的胶囊材料以及设计光生阴极保护涂料等解决途径。

In this paper,the research status of photocathodic protection in broadening light absorption range,enhancing electron-hole separation rate and conduction efficiency of electrons,and realizing protection in the dark were discussed.Six modification methods were summarized,including modification of conductive polymers,construction of heterojunction,composition with two-dimensional conductive materials,adjustment and control of topography,doping with metal or non-metallic elements and coupling with energy storage semiconductors.The problems,such as short duration of protection in the dark and low repeatability of some experiments,were pointed out.The unsolved technical difficulties,such as overcoming insufficient natural light intensity,the harsh conditions of electrolyte solution and the complexity of photocathodic protection system design,were analyzed.Finally,several solutions to above problems were proposed,such as the development of semiconductor materials driven by natural light,the preparation of colloidal electrolyte and capsule material for storing electrolyte,and the design of photocathodic protection coatings.