摘要
基于自主研制的0.25μm高压大栅宽GaN高电子迁移率晶体管(HEMT),采用LC低通谐振匹配技术和宽带功率合成技术,利用大栅宽HEMT有源模型以及键合线、电容和管壳等无源模型进行一体化仿真,匹配电路采用LC匹配网络和λ/4微带线将HEMT阻抗提高至50Ω,最终实现了连续波120 W宽带GaN功率器件。测试结果表明,该器件在36 V漏极工作电压和-2.0 V栅极工作电压下,2~4 GHz频带内连续波输出功率大于120 W,功率附加效率大于46%,功率增益大于9.5 dB,二次谐波抑制度大于20 dBc,杂波抑制度大于70 dBc。
Based on the independently developed 0.25 μm GaN high electron mobility transistor(HEMT) with high voltage and large gate-width, the integrated simulation was carried out by using LC low-pass resonance matching and wideband power combining technologies, large gate-width HEMT active model and passive models including bonding wire, capacitor and package.The matching circuit was designed with the structure of LC matching network and quarter-wavelength micro-strip line so that the impedance of the HEMT was improved to 50 Ω.Finally, a continuous wave 120 W wideband GaN power device was obtained.The test results show that in the frequency range of 2-4 GHz, at a drain operating voltage of 36 V and a gate operating voltage of-2.0 V,the continuous wave output power is greater than 120 W,the power additional efficiency is greater than 46%,the power gain is greater than 9.5 dB,the second harmonic suppression is greater than 20 dBc, and the clutter suppression is greater than 70 dBc.
作者
张一尘
吴景峰
银军
斛彦生
Zhang Yichen;Wu Jingfeng;Yin Jun;Hu Yansheng(The 13th Research Institute,CETC,Shijiazhuang 050051,China)
出处
《半导体技术》
CAS
北大核心
2021年第12期937-941,961,共6页
Semiconductor Technology
关键词
内匹配器件
功率放大
S波段
GAN
宽带
internally matched device
power amplification
S-band
GaN
wideband