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具有优化倍增层InAlAs/InGaAs雪崩光电二极管 被引量:2

InAlAs/InGaAs avalanche photodiode with an optimized multiplication layer
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摘要 通过优化倍增层的厚度,研究了InAlAs/InGaAs雪崩光电二极管增益带宽积和暗电流之间的关系。利用仿真计算得出200 nm厚的倍增层能够改善增益带宽积并降低暗电流。制成的InAlAs/InGaAs雪崩光电二极管性能优异,与计算趋势一致。在获得0.85 A/W的高响应和155 GHz的增益带宽积的同时,器件暗电流低于19 nA。这项研究对雪崩光电二极管在未来高速传输的应用具有重要意义。 In this paper,the trade-off between gain-bandwidth product(GBP)and dark current of an InAlAs/InGaAs avalanche photodiode(APD)was studied by optimizing multiplication layer.An optimized multiplication layer with 200 nm was proposed to improve the GBP and reduce the dark current.The fabricated InAlAs/InGaAs APD shows an excellent performance which is consistent with the calculated results.A high responsivity of 0.85 A/W(M=1)at 1.55μm and a high GBP of 155 GHz was achieved,whereas the dark current is as low as 19 nA at 0.9 Vb.This study is significant to the future high-speed transmission application of the avalanche photodiodes.
作者 顾宇强 谭明 吴渊渊 卢建娅 李雪飞 陆书龙 GU Yu-Qiang;TAN Ming;WU Yuan-Yuan;LU Jian-Ya;LI Xue-Fei;LU Shu-Long(Institute of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China;Key Laboratory of Nano-devices and Applications,Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China)
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2021年第6期715-720,共6页 Journal of Infrared and Millimeter Waves
基金 Supported by the National High Technology Research and Development Program of China(2018YFB2003305) the Key R&D Program of Jiangsu Province(BE2018005) the Science and Technology Service Network Initiative of the Chinese Academy of Sciences(KFJ-STS-ZDTP-086) the Support From SINANO(Y8AAQ11003) Natural Science Foundation of Jiangsu Province(BK20180252)。
关键词 雪崩光电二极管 增益带宽积 暗电流 avalanche photodiodes(APDs) gain-bandwidth product(GBP) dark current
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