摘要
阐述KLA 3xx系列机台可提供光掩模缺陷检测、量测和数据分析处理,能够协助光掩模制造商识别光掩模缺陷和图案位置错误,降低良率风险。由于该系列机台大多是在1990年代中期制造,受计算机操作系统处理能力和硬件空间限制,严重制约了它的产能利用。利用新型IBM服务器硬件性能和Synopsys公司CATS软件技术相结合的应用优势,设计一套独立于3xx系列机台的数据准备扩展系统,通过将处理后的数据导入3xx系列机台直接用于光掩模缺陷检测的方式,可实现对3xx系列机台产能的最大化利用。
KLA 3 xx series machine can provide photomask defect detection, measurement and data analysis and processing, which can help photomask manufacturers identify photomask defects and pattern position errors, and reduce yield risk. Since most of these machines were manufactured in the mid-1990 s, their capacity utilization was seriously restricted by the processing capacity of computer operating system and hardware space. Taking advantage of the application advantages of the combination of new IBM server hardware performance and Synopsys cats software technology, a set of data preparation and expansion system independent of 3 xx series machines is designed. By importing the processed data into 3 xx series machines and directly used for photomask defect detection, the maximum utilization of 3 xx series machine capacity can be realized.
作者
陈龙维
CHEN Longwei(Shanghai Toppan Photomask Co.,Ltd.,Shanghai 200233,China)
出处
《集成电路应用》
2021年第12期29-31,共3页
Application of IC