摘要
Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(i.e.,plasmonic lithography)provides a promising solution.The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive highthroughput methods.However,a smaller and steadier plasmonic nanogap,new scheme of plasmonic lens,and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication.Herein,a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s^(-1).A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses.Parallel lithography of the nanostructures with the smallest(around 26 nm)linewidth is obtained with the prototyping system.The proposed system holds great potential for high-freedom nanofabrication with low cost,such as planar optical elements and nano-electromechanical systems.
基金
We acknowledge the financial support by the National Natural Science Foundation of China(91623105 and 52005175)
Natural Science Foundation of Hunan Province of China(2020JJ5059).