摘要
氮化硅(Si_(3)N_(4))具有优异的物化性能,在国防、电子信息等关键领域都占据重要的地位。高质量粉体是制备高性能Si_(3)N_(4)陶瓷的首要前提。通常高质量Si_(3)N_(4)粉体需要满足粒径细、分布窄、α相含量高、杂质含量低等条件。基于合成反应体系综述了当前国内外制备Si_(3)N_(4)粉体的方法,着重从强化传热与传质角度介绍了改善粉体质量的研究进展,并介绍了当前工业生产现状,展望了高质量Si_(3)N_(4)粉体制备技术的发展趋势和方向。
Silicon nitride(Si_(3)N_(4))has excellent physical and chemical properties and occupies an important position in key fields such as national defense and electronic information.High quality Si_(3)N_(4) powders are the primary prerequisite for the preparation of high performance Si_(3)N_(4) ceramics.The high-quality powder requisites the conditions of fine particle size with narrow distribution,highαphase,low impurity and so on.The research advances in preparation technology of silicon nitride powder are summarized from the point of the synthesis reaction system,with the emphasis on summarizing the progress of the improvement of powder quality by enhancing heat and mass transfer.In addition,the present situations of industrial manufacture are introduced,and the development trend and direction of the preparation technology of high quality Si_(3)N_(4) powder are also prospected.
作者
向茂乔
耿玉琦
朱庆山
XIANG Maoqiao;GENG Yuqi;ZHU Qingshan(State Key Laboratory of Multi-phase Complex Systems,Institute of Process Engineering,Chinese Academy of Sciences,Beijing 100190,China;School of Chemical Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)
出处
《化工学报》
EI
CAS
CSCD
北大核心
2022年第1期73-84,共12页
CIESC Journal
基金
中国科学院青年创新促进会人才项目(292021000085)
南京绿色制造产业创新研究院重大项目(E0010708)。
关键词
氮化硅
粉体技术
碳热氮化法
硅粉直接氮化法
化学气相沉积法
硅胺前体转化法
合成机理
silicon nitride
powder technology
carbo-thermal nitriding method
silicon directly nitriding method
chemical vapor deposition method
silamine precursor conversion method
synthesis mechanism