特征分析视角下核心技术动态趋势识别——以光刻技术为例

Dynamic Trend Identification of Core Technology from the Perspective of Characteristic Analysis:A Case Study of Lithography

[研究目的]核心技术动态趋势的识别是技术创新的重要环节。本研究有利于为技术创新决策提供科学支撑。[研究方法]从技术核心特征分析视角出发,运用专利指标和合成指数法,构建核心特征测度指标模型和测度指数,结合聚类方法和网络可视化分析,分三个时期,对光刻核心技术动态趋势进行识别分析。[研究结论]光刻核心技术主要聚焦在图纹面的照相制版工艺,半导体器件,光学元件、系统或仪器和摄影、放映或观看用的装置或设备,其在2001-2020年间均保持了较高的核心性;2007-2013年光刻核心技术结构出现较大变动,纳米结构的应用成为核心技术;2014-2020年光刻技术整体上处于技术深化期,核心技术结构进一步稳固;此外,光刻技术之间存在核心-边缘结构特征,核心技术彼此之间关联较强,并与边缘技术相关联,而边缘技术彼此之间关联性较弱。

[Research purpose]The identification of the dynamic trend of core technology is an important task in technological innovation.The research in this paper is helpful to provide scientific support for technological innovation decision-making.[Research method]In this paper,from the perspective of technology core feature analysis,patent index and composite index method are used to construct core feature measure index model and measure index.Combined with clustering method and network visualization analysis,the dynamic trend of lithography core technology is identified and analyzed in three periods.[Research conclusion]The core technology of lithography mainly focuses on the photographic plate making process,semiconductor devices,optical elements,systems or instruments,and devices or equipment for photography,projection or viewing,which have maintained a high core during 2001-2020.The structure of the core lithography technology changed greatly from 2007 to 2013,and the application of nanostructure became the core technology.From 2014 to 2020,lithography technology as a whole is in the period of technological deepening,and the core technology structure is further stable.In addition,there is a core-periphery structure among lithography technologies,and the core technologies are strongly correlated with each other,and the edge technologies are weakly correlated with each other.