一种新型超高纯XCDA纯化器的研发

Development of a New Ultra-high Purity XCDA Purifier

新型XCDA纯化器纯化后的10N超高纯压缩空气,广泛应用于集成电路12寸14~28nm高端产线及第三代半导体等新兴领域,是半导体核心ASML光刻机生产中主要使用的气体之一。研发主要分为三部分,纯化器工艺设计、纯化器外观设计、纯化器自控系统设计。该纯化器采用两塔~四塔工作方式,改良大容量吸附剂,可抵抗原料气杂质波动,全自动设计,完善的报警连锁功能,保障设备安全运行,实现无人值守,工程师可进行现场及远端控制。

The 10N ultra-high-purity compressed air purified by the new XCDA purifier is widely used in emerging fields such as 12-inch 14~28nm high-end production lines of integrated circuits and third-generation semiconductors.It is the main product used in the production of semiconductor core ASML lithography machines.one of the gases.The research and development is mainly divided into three parts,purifier process design,purifier appearance design,purifier automatic control system design.The purifier adopts the working mode of two towers to four towers,and improves the large-capacity adsorbent,which can resist the fluctuation of impurities in the raw gas.The fully automatic design and perfect alarm chain function ensure the safe operation of the equipment and realize unattended operation.Engineers can carry out on-site and remote control.