硅片基底表面修饰及浸润性变化

Surface Modification and Wettability of Silicon Wafer Substrate

固体表面的浸润性是自然界普遍存在的一种性质,在人们的日常生活、工业和农业中具有重要的作用。液体对在固体界面的浸润行为源于固体的表面能和微纳米结构。基于自然界生物的浸润行为,人们对特殊浸润性的功能表面产生了极大地兴趣。近几年来,有关特殊浸润性表面的研究取得了不错的进展。在此,我们讨论了硅片基底表面修饰及其浸润性的变化。通过在超亲水的硅片基底上依次修饰氨基、含3A链的deoxyribonucleic acid(DNA)分子及含氟荧光基团的DNA分子,基底表面的浸润性发生变化。通过侧向力和原子力显微镜测试,表明具有疏水性的表面,侧向力会变小;而当表面具有亲水性时,侧向力变大。

The wettability of the solid surface is a common property in nature and it is a fundamental property of a solid surface, which plays an important role in people’s daily life, industry and agriculture. The wetting behavior of liquid on the solid interface is attributed to the surface energy and micro/nano structures of the solid. Based on the wettability behavior of natural organisms, people have great interest in the special wettability functional surface. In recent years, researchers have reported much research on the special wettable surfaces. Herein, we discussed the surface modification and wettability of the silicon wafer substrate. Through modifying amino groups, DNA molecules containing 3 A chains and the fluorine fluorescent group on a superhydrophilic silicon wafer substrate, the wettability changed accordingly. By use of the lateral force and atomic force microscopy, it was shown that the lateral force would become smaller when the surface was hydrophobic, while it would become larger when the surface was hydrophilic.