期刊文献+

基于Au/KMnAgSe_(2)/Ag结构存储器的阻变效应研究

Study of the Variable Resistance Effect Based on Au/KMnAgSe;/Ag Structured Memory
下载PDF
导出
摘要 采用高温固相法合成具有层状结构的KMnAgSe_(2),并首次将其作为阻变层材料制备成结构为Au/KMnAgSe_(2)/Ag的阻变器件。通过一系列电学测试研究了该夹层结构器件的阻变性能,研究表明Au/KMnAgSe_(2)/Ag器件具有明显的双极性阻变特性,并表现出较优的稳定性和非易失性。在经历连续200次的循环测试或103s的时间后电阻开关比仍旧保持在10以上。本实验研究结果为KMnAgSe_(2)应用到阻变存储器件中提供了材料基础和理论指导,将有望成为一种极具潜力的新型非易失性存储器。 KMnAgSe;with layered structure was synthesized by high temperature solid-state method and was first fabricated as a variable resistance layer into a resistive switching device structured as Au/KMnAgSe;/Ag. The variable resistance properties of this sandwiched structure are investigated through a series of electrical measurements. The results show that the Au/KMnAgSe;/Ag device has obvious bipolar variable resistance characteristics, which exhibits excellent stability and non-volatility. The resistance ratio remains above 10 after experiencing 200 consecutive cycle tests or 103 s.The results of this experimental study provide material basis and theoretical guidance for the application of KMnAgSe;in resistive random access memory, and it will be expected to become a new type of non-volatile memory with great potential.
作者 谭鑫 赖晓芳 Tan Xin;Lai Xiaofang(Guangdong University of Technology,School of Physics and Optoelectronic Engineering,Guangzhou 510006,China)
出处 《科学技术创新》 2022年第6期18-21,共4页 Scientific and Technological Innovation
关键词 阻变效应 金属导电细丝 非易失性 Variable resistance effect Metal conductive filament Non-volatile
  • 相关文献

参考文献5

二级参考文献140

  • 1WU X, ZHOU P, LI J, et al. Reproducible unipolar resistance switching in stoichiometric ZrO2 films [ J]. Appl Phys Lett, 2007, 90 (18): 183507-1-183507-3.
  • 2LINCY, WUCY, LEETC, etal. Effect of top electrode material on resistive switching properties of ZrO2 film memory devices [J]. IEEE Electron Device Lett, 2007, 28 (5): 366 - 368.
  • 3SEO S, LEE M J, SEO D H, et al. Reproducible resistance switching in polycrystalline NiO films [J]. Appl Phys Lett, 2004, 85 (23): 5655-5667.
  • 4FUJIMOTO M, KOYAMA H, KONAGAI M, et al. TiO2 anatase nanolayer on TiN thin film exhibiting high-speed bipolar resistive switching [J]. Appl Phys Lett, 2006, 89 (22): 223509-1 - 223509-3.
  • 5SCHINDLER C, THERMADAM S C P, WASER R, et al. Bipolar and unipolar resistive switching in Cu-doped SiO2 [J]. IEEE Trans Electron Devices, 2007, 54 (10); 2762- 2768.
  • 6WATANABE Y, BEDNORZ J G, BIETSCH A, et al. Current-driven insulator-conductor transition and nonvolatitle memory in chromium-doped SrTiO3 single crystals [ J]. Appl Phys Lett, 2001, 78 (23) : 3738- 3740.
  • 7YU L E, KIM S, RYU M K, et al. Structure effects on resistive switching of Al/TiOx/Al devices for RRAM applications [J]. IEEE Electron Device Letters, 2008, 29 (4): 331 - 333.
  • 8KIM S, BYUN I, HWANG I, et al. Giant and stable conductivity switching behaviors in ZrOa films deposited by pulsed laser depositions [J]. Jpn J Appl Phys, 2005, 44 (11): L345-L347.
  • 9CHOI B J, JEONG D S, KIM S K, et al. Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition [J]. J Appl Phys, 2005, 98 (3): 033715-1- 033715-10.
  • 10SEO S, LEE M J, SEO D H, et al. Reproducible resistance switching in polycrystalline NiO films [J]. Appl Phys Lett.2004, 85 (23): 5655-5667.

共引文献48

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部