摘要
通过磁控溅射氧化锌陶瓷靶材的方法在玻璃基片上制备ZnO薄膜,研究了溅射功率、溅射气压以及基片温度对ZnO薄膜相结构、禁带宽度及光学性能的影响。使用X射线衍射仪(XRD)分析了薄膜相结构,使用台阶仪测试薄膜厚度,采用薄膜测试仪测试薄膜的透过率,采用扫描电镜(SEM)观察薄膜表面形貌。结果表明:不同制备条件下均形成具有(002)择优取向的ZnO薄膜;工艺参数主要对薄膜的透过率造成影响;溅射功率的大小影响生成薄膜的完整性。
ZnO thin films were deposited on glass substrate by magnetron sputtering ZnO ceramic targets.The phase structure,band gap,transmittance and microstructure of the films were investigated by X-ray diffraction,scanning electron microscope and multifunctional film tester.The results show that the ZnO films with(002)preferred orientation can be formed under different process parameters.The process parameters affect the transmittance of the films.The coverage of films is determined by the sputtering power.
作者
刘沅东
LIU Yuan-dong(Beijing Institute Of Electronic Information,Beijing 100009,China)
出处
《真空》
CAS
2022年第1期29-32,共4页
Vacuum
关键词
磁控溅射
ZNO薄膜
透过率
magnetron sputtering
ZnO films
process parameters
transmittance
