摘要
Different post-treatment processes involving the use of ammonia and hexamethyldisilazane(HMDS) were explored for application to 351 nm third harmonic generation SiO_(2)antireflective(3ω SiO_(2)AR) coatings for high power laser systems prepared by the sol-gel method.According to experimental analysis,the 3ω SiO_(2)AR coatings that were successively post-treated with ammonia and HMDS at 150℃ for 48 h and again heat-treated at 180℃ for 2 h(N/H 150+180 AR) were relatively better.There were relatively fewer changes in the optical properties of the N/H 150+180 AR coating under a humid and polluted environment,and the increase in defect density was slow in high humidity environments.The laser-induced damage threshold of the N/H 150+180 AR coating reached 15.83 J/cm;(355 nm,6.8 ns),a value that meets the basic requirements of high power laser systems.
作者
沈斌
熊怀
张旭
陈知亚
庞向阳
郭亚晶
梁成杰
李海元
Bin Shen;Huai Xiong;Xu Zhang;Zhiya Chen;Xiangyang Pang;Yajing Guo;Chengjie Liang;Haiyuan Li(Key Laboratory of High Power Laser and Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)
基金
supported by the Strategic Priority Research Program of Chinese Academy of Sciences (No. XDA25020305)