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FIB-SEM双束系统在红外焦平面探测器研制中的应用

Applications of the FIB-SEM Dual Beam System in the Development of Infrared Focal Plane Detector
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摘要 聚焦离子束扫描电子显微镜(Focused Ion Beam Scanning Electron Microscope,FIB-SEM)双束系统结合了扫描电子显微镜与聚焦离子束系统的优势。基于该系统的高分辨率、原位加工及观测的特点,研究了它在缺陷与像元解剖分析、透射电镜样品制备以及电路修复等方面的应用。详细介绍了用FIB-SEM系统定位问题像元的方法和修复电路的具体过程,并阐明了它对红外焦平面探测器研制的重要作用。该系统是高性能红外探测器研制过程中不可或缺的重要表征手段。 The focused ion beam scanning electron microscope system combines the advantages of scanning electron microscope and focused ion beam system.Based on the advantages of high resolution,in-situ processing and observation,its applications in defect anatomical analysis,pixel anatomical analysis,transmission electron microscope sample preparation and circuit repair are studied in this paper.The method of locating pixels with problems and the specific process of circuit repair are introduced in detail,and its important role in the development of infrared focal plane detectors is illustrated.The system is an indispensable characterization means in the development of high-performance infrared detectors.
作者 李乾 黄婷 折伟林 王丹 邢伟荣 LI Qian;HUANG Ting;SHE Wei-lin;WANG Dan;XING Wei-rong(North China Research Institute of Electro-Optics, Beijing 100015,China)
出处 《红外》 CAS 2022年第2期34-39,共6页 Infrared
关键词 红外焦平面探测器 聚焦离子束扫描电子显微镜 电路修复 infrared focal plane detector FIB-SEM circuit repair
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  • 1赵玉清.电子束离子束技术[M].西安:西安交通大学出版社,2003.61.
  • 2Sheu B L, Wang Y L. Emission properties of a dual ion/electron source based on Au-In alloy [J]. Applied Physics Letters. 2002,80(8).
  • 3Diebold A C.Materials and failure analysis methods and symptoms used in the development and manufacture of silicon integrated circuit [J ]. Vac. Sci. Technol , 1994,B12(4): 2768-2778.
  • 4Gerlach W. Gold silicon phase diagram [J]. Solid-state Electronics, 1967,10(6):589-592
  • 5Orloff J. High-resolution focused ion beams [J].Review of scien tific Instrument, 1993,64(15): 1105030
  • 6Prewett P D, GLR mair. Some comment on mechanism of liquid metal ion source[J].J phys,1983:D17:2305-2321.
  • 7Melngailis J. Ion Sources for Nanofabrication and High ResolutionLithography[C]. Chicago:Proceeding of the 2001 Particle Accelea-ator Conference.2001.76-80.
  • 8董桂芳,袁忠远,汪健如,应根裕,张克潜.镓液态金属离子源的制备[J].微细加工技术,1998(3):42-45. 被引量:9
  • 9牟宏山,董硕,梁进智.锑化铟红外焦平面探测器盲元失效问题的研究[J].红外,2010,31(7):9-13. 被引量:7
  • 10赵建忠.InSb焦平面探测器的发展现状与趋势[J].红外技术,2016,38(11):905-913. 被引量:16

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