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脱硫、脱硝用脉冲电源的设计及工业应用

Design and industrial application of pulse power supply for desulfurization and denitration
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摘要 使用常规半导体开关和脉冲磁压缩技术开发了平均功率15 kW、脉冲上升时间500 ns、重复频率300 Hz的脱硫、脱硝用脉冲电源。配备了9台电源的脉冲电晕等离子体脱硫、脱硝装置,在1台130 t/h蒸发量的燃煤锅炉上配套使用,取得了59%的脱硫效率、53%的脱硝效率和77%的除尘效率。 A type of pulsed power for desulfuration and denitration has been developed with ordinary semiconductor switches and magnetic pulse compression technology. Its design specifications are as follows: an average power of 15 kW, a voltage rising time of 500 ns and a pulse repetition rate of 300 Hz. A pulsed plasma reactor for simultaneous removal of SO;and NO;was constructed with 9 pulsed powers and was tested in a coal-fired boiler with 130 t/h evaporation capacity. The test results showed removal efficiency for SO;of 59%, removal efficiency for NO;of 53%, and removal efficiency for dust of 77%.
作者 孔春林 杜佳棋 张德轩 KONG Chunlin;DU Jiaqi;ZHANG Dexuan(Hangzhou Tianming Environmental Protection Co.,Ltd.Hangzhou 310018)
出处 《工业安全与环保》 2022年第3期84-87,共4页 Industrial Safety and Environmental Protection
关键词 脉冲电晕 等离子体 脱硫 脱硝 pulsed corona plasma desulfuration denitration
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  • 1张齐,杨萍.燃煤工业锅炉除尘脱硫脱氮技术:第一编 国外大气污染物SO2,NOX治理技术[J].大气环境,1989,4(6):1-35. 被引量:2
  • 2郝吉明.燃煤SO2污染控制技术现状[J].电除尘及气体净化,1999,5(2):24-24.
  • 3薄以匀.我国烟气脱硫技术的进展[J].电除尘及气体净化,1999,5(2):18-18.
  • 4BluhmH.脉冲功率系统的原理与应用[M].江伟华,张弛,等(译).北京:清华大学出版社,2008.
  • 5LI Z, SAKAI S, YAMADA C, et al.The effects of pulsed streamer-like discharge on cyanobacteria cells[J]. IEEE Transactions on Plasma Science, 2006,34(5): 1719-1724.
  • 6LI Z, HOSSE1NI S H R,UENO T, et al. Effects of output peaking capacitor on the propagation of the underwater streamer discharges[J]. IEEE Transactions on Plasma Science, 2009, 37(10): 1987-1992.
  • 7SAKUGAWA T,AKIYAMA H.An all-solid-state pulsed-power generator using a high-speed gate-turn-off thyristor and a saturable transformer[J].Electr Eng Japan, 2002,140(4): 17-26.
  • 8MELVILLE W S.The use of saturable inductors as discharge devices for pulse generators[J].Proc IEEE, 1951,98:185-207.
  • 9MIZOGUCHI H, WAKABAYASHI O, ARUGA T, et al.High power KrF excimer laser with a solid state switch for microlithography[J]. The International Society for Optical Engineering-SPIE, 1996,2726: 813-840.
  • 10SAKUGAWA T, WANG D, SH1NOZAKI K, et al.Repetitive short-pulsed generator using MPC and blumlein line[C]///EEE 14^th Pulsed Power Conf. [S.I.]: IEEE,2003:657-660.

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