磁控溅射用W-Ti合金靶材的研究进展

Research Progress of W-Ti Alloy Targets for Magnetron Sputtering

W-Ti合金靶材可作为原材料,通过磁控溅射技术,制备W-Ti、W-Ti-N、W-Ti-O等功能薄膜,应用于集成电路、薄膜太阳能电池等领域。本文介绍了W-Ti合金靶材的性能指标、各种制备技术和应用领域,提出高纯度、全致密、少富Ti相、小粒径、大尺寸、低成本是W-Ti合金靶材的重要方向。

W-Ti alloy targets can be used as raw materials to prepare W-Ti,W-Ti-N,W-Ti-O and other functional films by magnetron sputtering technology,which can be used in integrated circuits,thin film solar cells and other fields. In this paper,the performance indexes,preparation techniques and application areas of W-Ti alloy targets were introduced. Finally,the authors suggest that high purity,full density,less Ti-rich phase,small particle size,large size and low cost are important directions of W-Ti alloy targets.