摘要
为了研究磁控溅射过程中基体温度对涂层结构和性能的影响。利用磁控溅射技术在Zr-4合金表面制备不同基体温度下的TiN涂层,用X射线衍射(XRD)技术分析涂层的物相成分和残余应力,采用扫描电子显微镜(SEM)表征涂层表面和截面的微观形貌,用划痕仪测量涂层与基体结合强度。研究结果表明:不同基体偏压下制备的涂层表面均匀但略微粗糙,且涂层表面存在一定数量的熔覆状颗粒和沟壑状褶皱;由涂层XRD衍射谱可知,不同基体加热温度制备的涂层各主要衍射峰所对应的晶体晶相都能较好地对应,随着基体加热温度的升高,TiN(111)晶相的衍射峰值逐步增大,TiN(200)晶相衍射峰值逐步减小;由扫描电子显微镜(SEM)结果可知,随基体温度的升高,涂层的膜厚和表面形貌均发生了明显的变化,基体温度为300℃时,涂层表面平整、光滑、起伏小,成膜质量最好;由划痕仪检测结果可知,偏压为300℃时,Zr-4合金基体与涂层的结合强度最好;由残余应力结果可知,基体温度为300℃时,涂层残余应力最小。
In order to study the effect of substrate temperature on the structure and properties of coatings during magnetron sputtering.TiN coatings at different substrate temperatures were prepared on the surface of Zr-4 alloy by magnetron sputtering.The phase composition and residual stress of the coating were analyzed by X-ray diffraction(XRD),the micro morphology of the surface and section of the coating were characterized by scanning electron microscope(SEM),and the bonding strength between the coating and the substrate was measured by scratch tester.The results show that the coating surface prepared under different substrate bias is uniform but slightly rough,and there are a certain number of cladding particles and gully folds on the coating surface.The XRD diffraction spectrum of the coating shows that the crystal phases corresponding to the main diffraction peaks of the coating prepared at different substrate heating temperatures can correspond well.With the increase of substrate heating temperature,the diffraction peak of TiN(111)crystal phase gradually increases and the diffraction peak of TiN(200)crystal phase gradually decreases.The results of scanning electron microscope(SEM)show that the film thickness and surface morphology of the coating change significantly with the increase of substrate temperature.When the substrate temperature is 300℃,the coating surface is flat,smooth and has little fluctuation,and the film-forming quality is the best.According to the test results of scratch tester,the bonding strength between Zr-4 alloy matrix and coating is the best when the bias voltage is 300℃;According to the residual stress results,when the substrate temperature is 300℃,the residual stress of the coating is the smallest.
作者
唐德文
谭志强
肖魏魏
黄景昊
Tang Dewen;Tan Zhiqiang;Xiao Weiwei;Huang Jinghao(School of Mechanical Engineering,Nanhua University,Hengyang,Hunan 421001,China;Hunan Collaborative Innovation Center for Nu-clear Fuel Cycle Technology and Equipment,Nanhua University,Hengyang,Hunan 421001,China)
出处
《机电工程技术》
2022年第2期31-34,共4页
Mechanical & Electrical Engineering Technology
基金
耐事故燃料包壳锆合金表面多层纳米复合涂层表征及腐蚀行为研究(编号:190SYS007)。
关键词
TIN涂层
基体温度
微观形貌
结合强度
残余应力
TiN coating
substrate temperature
micro morphology
bonding strength
residual stress