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Experimental study on plasma actuation characteristics of nanosecond pulsed dielectric barrier discharge 被引量:1

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摘要 Combining high-speed schlieren technology and infrared imaging technology,related research has been carried out on the influence of parameters such as actuation voltage,repetition frequency,and electrode size of an actuator on the discharge characteristics,induced flow field characteristics,and thermal characteristics of nanosecond pulsed dielectric barrier discharge.The results show that increasing the value of the actuation voltage can significantly increase the actuation intensity,and the plasma discharge area is significantly extended.Increasing the repetition frequency can increase the number of discharges per unit time.Both will cause more energy input and induce more changes in the flow field.The effect of temperature rise is more significant.The width of the covered electrode will affect the potential distribution during the discharge process,which in turn will affect the extension process of the plasma discharge filament.Under the same actuation intensity,the wider the covered electrode,the larger range the induced flow field and temperature rise is.Preliminary experimental analyses of high-frequency actuation characteristics,temperature field characteristics,flow field characteristics and actuation parameter settings provide support for the parameter selection and partial mechanism analysis of plasma anti-icing.
作者 郑浩 梁华 陈杰 宗豪华 孟祥喆 谢理科 李应红 Hao ZHENG;Hua LIANG;Jie CHEN;Haohua ZONG;Xiangzhe MENG;Like XIE;Yinghong LI(Science and Technology on Plasma Dynamics Laboratory,Air Force Engineering University,Xi'an 710038,People’s Republic of China;Chinese Flight Test Establishment,Xi’an 710089,People’s Republic of China;School of Mechanical Engineering,Xi’an Jiaotong University,Xi’an 710049,People’s Republic of China)
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2022年第1期129-138,共10页 等离子体科学和技术(英文版)
基金 supported by the National Key R&D Program of China(No.2019YFA0405300) National Natural Science Foundation of China(Nos.51907205 and 12002363)。
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