亚分辨率辅助图形在0.11μm工艺上的应用

Application of Sub-resolution-assist-features in 0.11μm Process

亚分辨率辅助图形(Sub Resolution Assist Features,SRAF)作为一种常用的分辨率增强技术(Resolution Enhancement Technique,RET),一般被应用于90nm及以下工艺节点。本文通过对SRAF规则(rule)的选择及验证,实现了0.11μm工艺在KrF光刻机上的量产。

Sub Resolution Assist Features(SRAF),as a common resolution enhancement technique(RET),is generally applied to process nodes of 90nm and below.In this paper,through the selection and verification of SRAF rule,the production of 0.11μm process on KrF lithography is achieved.