摘要
采用两步水热法在导电玻璃(FTO)上制备了WO_(3)/NiWO_(4)复合薄膜。通过XRD,SEM表征了WO_(3)/NiWO_(4)复合薄膜的组成结构及微观形貌,利用UV-Vis、光电流测试、光电催化测试和交流阻抗测试分析了WO_(3)/NiWO_(4)复合薄膜的光电性能。结果表明:WO_(3)/NiWO_(4)复合薄膜相较于WO_(3)薄膜具有更好的光吸收特性、光电流密度和光电催化活性,其中水热反应3 h的WO_(3)/NiWO_(4)复合薄膜的光电化学性能最佳。WO_(3)/NiWO_(4)-3 h在1.4 V(vs.Ag/AgCl)时的光电流密度为1.94 mA/cm^(2),光电催化210 min对亚甲基蓝溶液的降解效率为57.1%。交流阻抗图谱表明WO_(3)/NiWO_(4)薄膜的电荷转移电阻小于WO_(3)薄膜,光电化学性能更优。
A two-step hydrothermal method was applied to create WO_(3)/NiWO_(4)composite films on conductive glass(FTO).The structure and morphology of WO_(3)/NiWO_(4)composite films were characterized by XRD and SEM.The photoelectric properties of WO_(3)/NiWO_(4)composite films were analyzed by UV-VIS,photocurrent test,photoelectrocatalytic test and AC impedance test.The analysis results indicate that the WO_(3)/NiWO_(4)composite film has better light absorption characteristics,photocurrent density and photoelectrocatalysis activity than WO_(3)film,and the WO_(3)/NiWO_(4)composite film with 3 hours hydrothermal reaction has the best photoelectrochemical properties.The photocurrent density of WO_(3)/NiWO_(4)-3 h was 1.94 mA/cm^(2)at 1.4 V(vs.Ag/AgCl),and the photoelectrocatalytic efficiency of WO_(3)/NiWO_(4)-3 h for methylene blue solution was 57.1%for 210 min.The AC impedance diagram reveals that the charge transfer resistance of WO_(3)/NiWO_(4)film is less than that of WO_(3)film,which corresponds to improved photoelectrochemical properties.
作者
于舒睿
王蓟
杨继凯
王国政
杨雪
聂德财
李思远
YU Shurui;WANG Ji;YANG Jikai;WANG Guozheng;YANG Xue;NIE Decai;LI Siyuan(School of Physics,Changchun University of Science and Technology,Changchun 130022,CHN)
出处
《半导体光电》
CAS
北大核心
2022年第1期137-142,共6页
Semiconductor Optoelectronics
基金
吉林省科技厅技术攻关项目(20190302125GX)
吉林省科技厅重大科技专项项目(20200501006GX)
吉林省科技厅项目(20200201077JC)。
