摘要
高熵合金是近年来涌现出的一种新型金属材料,由多种元素以近等原子比例组成,具有在结构上类似有序晶体材料,但是在化学成分上无序排列的结构特征,在物理、化学和机械性能等方面表现出许多不同于传统合金的独特优异性能.高熵合金薄膜是在高熵合金的基础上发展出的一种新型薄膜材料,不仅继承了高熵合金的优良性能,甚至部分性能还得到进一步提升.改变高熵合金薄膜的组成元素以及薄膜制备参数均会对其性能产生极大的影响,由此可以获得阻碍扩散、耐腐蚀、高温稳定或生物相容等不同性质的高熵合金薄膜.近年来,高熵合金薄膜在各个领域快速发展,引起广泛的关注,已经成为新的研究热点.本文主要综述高熵合金薄膜的基本特点、制备方法、微结构及性能,回顾高熵合金薄膜近期研究进展,并对未来高熵合金薄膜的研究进行简单展望.
High-entropy alloys represent a new type of metallic materials that have emerged in recent years.These alloys are composed of various elements with nearly equal atomic proportions and have structural features similar to those of ordered crystalline material in terms of packing but a disordered arrangement in terms of chemical composition.Such alloys show unique properties that differ from those of traditional alloys and excellent physical,chemical,and mechanical performance.High-entropy alloy film is a new type of film developed from high-entropy alloy;these films not only inherit the favorable properties of high-entropy alloys but also exhibit a number of improved properties.The constituent elements of high-entropy alloy films and film preparation parameters exert an important influence on the properties of the resulting films.Alteration of these factors yields high-entropy alloy films with different properties,such as diffusion resistance,corrosion resistance,high temperature stability,and biocompatibility.The technology of highentropy alloy thin films for various applications has rapidly developed.Thus,these films have attracted wide attention and become a new research hotspot.This article describes the basic characteristics,preparation methods,microstructures,and properties of highentropy alloy thin films,reviews the recent research progress on these films,and provides a brief summary of their future prospects.
作者
曹庆平
杨超范
王晓东
蒋建中
CAO QingPing;YANG ChaoFan;WANG XiaoDong;JIANG JianZhong(School of Materials Science&Engineering,Zhejiang University,Hangzhou 310027,China)
出处
《中国科学:技术科学》
EI
CSCD
北大核心
2022年第3期359-374,共16页
Scientia Sinica(Technologica)
基金
国家重点研发计划(编号:2016YFB0700201,2016YFB0701203)
国家自然科学基金(批准号:51871198,51671170)资助项目。
关键词
高熵合金薄膜
制备
磁控溅射
微结构
性能
high entropy alloy thin films
preparation
magnetron sputtering
microstructure
properties