O/W型乳化液中噻二唑衍生物对铜板的缓蚀效果

CORROSION INHIBITION EFFECT OF THIADIAZOLE DERIVATIVES ON COPPER PLATE IMMERSED IN O/W EMULSION

针对铜板带在加工成形过程中易氧化变色的问题,基于密度泛函理论,采用量子化学计算、电化学测试和表面表征等手段,分别研究了缓蚀剂甲基苯三唑衍生物(MBD)、2,5-双(正辛基二硫代)噻二唑(EDD)和2,5-双(十二烷基二硫代)噻二唑(BDDT)在真空、油溶液、水溶液、乳化液中对铜板的缓蚀效果。结果表明:MBD在Cu表面的吸附以物理吸附为主,EDD和BDDT在Cu表面的吸附主要为化学吸附;3种缓蚀剂对铜的缓蚀效率从低到高的顺序为MBD(76.39%)<EDD(83.95%)<BDDT(89.01%),BDDT抑制乳化液对铜腐蚀的效果最好。

To solve the problem of oxidation and discoloration of copper surface during metal-forming process,the corrosion inhibition behaviors of methyl benzentriazole derivatives(MBD),2,5-bis(n-octyldithiazole)thiadiazole(EDD)and 2,5-bis(dodecyldithiazole)thiadiazole(BDDT)as corrosion inhibitor in vacuum,oil,water and emulsions were studied by density functional theory(DFT),electrochemistry and surface characterization methods.The results show that the adsorption of MBD on Cu surface is dominated by physical adsorption,while the adsorption of EDD and BDDT on Cu surface is dominated by chemical adsorption.The inhibition efficiency of the three corrosion inhibitors on the copper surface is in the order of MBD(76.39%)<EDD(83.95%)<BDDT(89.01%).BDDT has the best inhibition effect on inhibiting the corrosion of copper immersed in emulsion.