缺陷半导体用于光催化固氮的研究进展

Research Progress of Defective Semiconductor Used in Photocatalytic Nitrogen Fixation

NH_(3)不仅是生产各种化学品的必要原料,也是清洁能源的一种重要载体,与人类社会的发展紧密联系。以清洁的太阳能作为唯一能量输入的光催化固氮技术,在温和条件下利用N_(2)和H_(2)O直接产生NH_(3),近年来引起人们广泛的关注。光催化固氮技术具有环境友好、节能、操作简便等优点,但传统的半导体光催化剂在光捕获和光生载流子利用方面受到限制,不能充分发挥其活性。因此,需要设计相应的催化剂用来提高材料对惰性N_(2)分子吸附和活化能力,从而提高固氮性能。本文首先对光催化固氮进行了简要概述,介绍了光催化固氮可能存在的两种反应机理,随后着重介绍了含有氧、氮、硫空位的半导体材料对光催化固氮的影响。最后,对光催化固氮领域的现有挑战和未来发展给出了一些实际的见解。

As an important carrier of clean energy,NH_(3)is a necessary raw material for the production of various chemicals,which is closely related to the rapid development of human society.The photocatalytic nitrogen fixation technology has attracted extensive attention of researchers in recent years,since it uses clean solar energy as the only energy input toward directly converting N_(2)and H_(2)O to NH_(3)under mild conditions.Although the advantages of photocatalytic nitrogen fixation technology are environmentally friendly,energy conservation and easy to operate,the traditional semiconductor photocatalyst used for nitrogen fixation cannot fully exert its activity due to the restriction in light harvest and utilization of photogenerated carriers.In order to efficiently enhance the nitrogen fixation performance,thus,it is necessary to design the corresponding catalysts to improve the adsorption and activation of inert N_(2)molecules.In this paper,first of all,a brief overview of photocatalytic nitrogen fixation was given and two possible reaction mechanisms of photocatalytic nitrogen fixation were introduced.Then,the focus was put on the influence of semiconductor materials containing oxygen,nitrogen and sulfur vacancies on photocatalytic nitrogen fixation.Finally,some practical opinions on the current challenges and future development in the field of photocatalytic nitrogen fixation were given.